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Application of surfactants in pigment surface treatment

It is found that fatty amine type nonionic surfactants can play a good effect on the surface treatment of pigments, the reason why they can play this good effect is that: these surfactants can be adsorbed onto the surface of pigments by forming hydrogen bonds with nitrogen on the surface of pigments through one H in one OH and one NH, and forming adsorption coating film with its lipophilic hydrocarbon chains, and the coating film formed can effectively prevent the agglomeration of pigment particles during the drying process. The formed coating film can effectively prevent the agglomeration of pigment particles during the drying process, thus inhibiting the growth of grains and obtaining fine crystalline pigment particles. Translated with www.DeepL.com/Translator (free version)

This kind of treated pigment in organic medium, due to the good compatibility of hydrocarbon chain and organic medium can be quickly solubilized to form solubilized film, so that the pigment particles can be easily dispersed, and at the same time, it can also play a role in preventing the flocculation of pigment particles when they are close to each other. This effect is strengthened by the growth of hydrocarbon chain and the thickening of solventized film, which is beneficial to the refinement and narrow distribution of pigment particles. Its hydrophilic group is hydrated to form a hydration film, which can effectively prevent the flocculation between pigment particles and make the pigment particles easy to disperse. Translated with www.DeepL.com/Translator (free version)

1, the importance of chemical cleaning: process experiments in each experiment have chemical cleaning problems, chemical cleaning of good or bad experimental results have a serious impact, improper handling, you will not get the experimental results or experimental results are not good. Therefore, to clarify the role and principle of chemical cleaning, the process of good experiments have important significance.

As you know, one of the important characteristics of semiconductors is very sensitive to impurities, as long as there is a millionth, or even a trace of impurities, will have an impact on the physical properties of semiconductors, we are using this characteristic, through the method of doping . The production of various functions of semiconductor devices. But also because of this characteristic, to the semiconductor device process experiments bring trouble and difficulties. The chemical reagents used, production tools, cleaning water, etc. may become a source of contamination of harmful impurities. Even clean semiconductor wafers, a longer exposure to air. Will also introduce obvious impurities staining. Chemical cleaning is to eliminate harmful impurities staining, to keep the silicon wafer surface clean.

2, the scope of chemical cleaning: chemical cleaning mainly includes three aspects of cleaning, one is the cleaning of the silicon wafer surface; second is the use of metal materials (such as tungsten wire for evaporation electrodes, for evaporation pad with molybdenum, for evaporation source with aluminum, chrome plate with chromium, etc.) cleaning; third is the use of tools, utensils (such as metal tweezers. Quartz tube, glass containers, graphite molds, plastic and rubber products, etc.) of cleaning.

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